ABSTRACTBy using aberration corrected scanning transmission electron microscopy we have found no small scale lateral In composition fluctuations exist in the In_0.15Ga_0.85N active region of a light emitting diode. Images were acquired at 2% of the electron dose known to create electron beam damage, so the acquired images reflect the intrinsic structure of the InGaN active region. Position averaged convergent beam electron diffraction reveals the local sample thickness where images were acquired is 4.8 nm, eliminating the possibility that the absence of composition variation was observed due to projection through a thick sample. In addition, 2-3 atomic layer steps were observed in the top surface of In_0.08Ga_0.92N layers and the In_0.15Ga_0.85N active layers, providing a possible mechanism for lateral carrier confinement.