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Royal Society of Chemistry, Chemical Communications, 78(48), p. 9741

DOI: 10.1039/c2cc35010f

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Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

Journal article published in 2012 by Xin Deng, Jillian M. Buriak ORCID, Pei-Xia Dai, Li-Jun Wan, Dong Wang ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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