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X-ray excited optical luminescence (XEOL): a potential tool for OELD studies

Journal article published in 2000 by Tk K. Sham, R. Sammynaiken, Yj J. Zhu, P. Zhang ORCID, I. Coulthard, Sj J. Naftel
This paper is available in a repository.
This paper is available in a repository.

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Abstract

An X-ray excited optical luminescence (XEOL) technique using laboratory soft X-rays and synchrotron radiation in the visible-UV and soft X-ray region will be discussed. It is shown that XEOL takes advantage of the penetration power of the X-rays and the tunability of the photons from a synchrotron source. Thus XEOL provides some sampling depth and site selectivity and allows for the probing of underlayers and buried interfaces. XEOL studies of porous silicon and a poly-vinyl-carbazole film will be used to illustrate that this technique is suited for the study of organic luminescent materials and organic electroluminescence devices (OELD).