Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 5(28), p. 1060
DOI: 10.1116/1.3456123
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Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2
Journal article published in 2010 by
D. R. Baer,
M. H. Engelhard,
A. S. Lea,
P. Nachimuthu,
T. C. Droubay 
,
J. Kim,
B. Lee,
C. Mathews,
R. L. Opila,
L. V. Saraf,
W. F. Stickle,
R. M. Wallace ,
B. S. Wright
,
J. Kim,
B. Lee,
C. Mathews,
R. L. Opila,
L. V. Saraf,
W. F. Stickle,
R. M. Wallace ,
B. S. Wright
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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