Published in

Elsevier, Journal of Crystal Growth, (414), p. 105-109, 2015

DOI: 10.1016/j.jcrysgro.2014.09.008

Links

Tools

Export citation

Search in Google Scholar

Growth of AlInN/GaN distributed Bragg reflectors with improved interface quality

This paper is available in a repository.
This paper is available in a repository.

Full text: Download

Green circle
Preprint: archiving allowed
Orange circle
Postprint: archiving restricted
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO

Abstract

a r t i c l e i n f o Communicated by M. Weyers Keywords: A1. Interfaces A1. X-ray diffraction A3. Superattices A3. Metalorganic vapor phase epitaxy B1. Nitrides B2. Semiconducting ternary compounds a b s t r a c t We report on lattice-matched AlInN/GaN distributed Bragg reflectors (DBRs) with improved overgrowth of the AlInN layers. Typically, AlInN layers are exposed to high temperatures when changing to GaN growth conditions. Uncapped AlInN surfaces suffer from In desorption leading to formation of 2 nm thick AlN interface layers with micro-cracks at the AlInN surface. Capping the AlInN with 5 nm GaN at the same temperature and subsequent overgrowth with GaN at high temperatures resolves the In-desorption problem and DBRs with improved interface quality and smooth surfaces are achieved. Optical properties of high-reflectivity DBR structures such as maximum reflectivity and bandwidth are virtually unaffected whether or not unintentionally-grown AlN interlayers are present. & 2014 Elsevier B.V. All rights reserved.