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Nature Research, Scientific Reports, 1(5), 2015

DOI: 10.1038/srep17380

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Structural modifications due to interface chemistry at metal- nitride interfaces

Journal article published in 2015 by S. K. Yadav, S. Shao, J. Wang ORCID, X.-Y. Liu
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

AbstractBased on accurate first principles density functional theory (DFT) calculations, an unusual phenomenon of interfacial structural modifications, due to the interface chemistry influence is identified at two metal-nitride interfaces with strong metal-nitrogen affinity, Al/TiN {111} and Al/VN {111} interfaces. It is shown that at such interfaces, a faulted stacking structure is energetically preferred on the Al side of the interface. And both intrinsic and extrinsic stacking fault energies in the vicinity Al layers are negligibly small. However, such phenomenon does not occur in Pt/TiN and Pt/VN interfaces because of the weak Pt-N affinity. Corresponding to structural energies of metal-nitride interfaces, the linear elasticity analysis predicts characteristics of interfacial misfit dislocations at metal-nitride interfaces.