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Nature Research, Scientific Reports, 1(4), 2014

DOI: 10.1038/srep03882

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A facile process for soak-and-peel delamination of CVD graphene from substrates using water

Journal article published in 2014 by Priti Gupta, Pratiksha D. Dongare ORCID, Sameer Grover, Sudipta Dubey, Hitesh Mamgain, Arnab Bhattacharya, Mandar M. Deshmukh ORCID
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

We demonstrate a simple technique to transfer chemical vapour deposited (CVD) graphene from copper and platinum substrates using a soak-and-peel delamination technique utilizing only hot deionized water. The lack of chemical etchants results in cleaner CVD graphene films minimizing unintentional doping, as confirmed by Raman and electrical measurements. The process allows the reuse of substrates and hence can enable the use of oriented substrates for growth of higher quality graphene, and is an inherently inexpensive and scalable process for large-area production.