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American Physical Society, Physical Review Letters, 7(106)

DOI: 10.1103/physrevlett.106.077801

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Dynamical Model for the Formation of Patterned Deposits at Receding Contact Lines

Journal article published in 2011 by Lubor Frastia, Andrew J. Archer, Uwe Thiele ORCID
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This paper is available in a repository.

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Abstract

We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organized pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.