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IOP Publishing, Semiconductor Science and Technology, 7(15), p. 766-769

DOI: 10.1088/0268-1242/15/7/318

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Formation of GaAsN nanoinsertions in a GaN matrix by metal-organic chemical vapour deposition

This paper is available in a repository.
This paper is available in a repository.

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Abstract

Coherent ultrathin GaAsN insertions are formed in a GaN matrix by predeposition of an ultrathin GaAs layer on a GaN surface, followed by annealing in an NH3 atmosphere and overgrowth with GaN. During the overgrowth, most of the As atoms are substituted by N, with a dense array of coherent GaAsN nanodomains with lateral sizes of about 3-4 nm formed in the GaN matrix. We report a green luminescence due to GaAsN insertions, surviving at high observation temperatures and excitation densities.