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Springer Verlag, Journal of Phase Equilibria and Diffusion, 6(29), p. 477-481

DOI: 10.1007/s11669-008-9390-0

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Microstructural Evidence of βCo2Si-phase Stability in the Co-Si System

Journal article published in 2008 by Renato Baldan, Mist Faria, Ca Nunes, Gc Coelho, Vm Chad, Roberto Ribeiro de Avillez, Rr De Avillez ORCID
This paper is available in a repository.
This paper is available in a repository.

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Abstract

The aim of this work was to verify the stability of the beta Co2Si phase in the Co-Si system. The samples were produced via arc-melting and characterized through Scanning Electron Microscopy (SEM) and Differential Thermal Analysis (DTA). The results have confirmed the stability of the beta Co2Si phase, however, a modification of the shape of beta CoSi phase field is proposed in order to fully explain the results.