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Wiley, Chemistry - An Asian Journal, 2(7), p. 277-281, 2011

DOI: 10.1002/asia.201100750

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Grafting of Metallacarboranes onto Self-Assembled Monolayers Deposited on Silicon Wafers

This paper is available in a repository.
This paper is available in a repository.

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Abstract

Stuck on you: Amine-, oxyamine-, and isocyanate-terminated self-assembled monolayers were deposited on silicon wafers for reaction with cobaltabisdicarbollide derivatives. The reaction of the isocyanate group with [NMe(4) ][8-NH(2) -C(4) H(8) O(2) -3,3-Co(1,2-C(2) B(9) H(10) )(1,2-C(2) B(9) H(11) )] gave homogeneous monolayers of cobaltabisdicarbollide moieties covalently linked to the surface.