Large area resist-free soft lithographic patterning of graphene
Journal article published in 2012 by
Antony George 
,
S. Mathew,
Raoul van Gastel,
R. Van Gastel,
Maarten Nijland,
K. Gopinadhan,
Peter Brinks ,
T. Venkatesan,
Johan E. Ten Elshof
,
S. Mathew,
Raoul van Gastel,
R. Van Gastel,
Maarten Nijland,
K. Gopinadhan,
Peter Brinks ,
T. Venkatesan,
Johan E. Ten Elshof
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Abstract
Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.