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Society of Photo-optical Instrumentation Engineers, Journal of Micro/Nanolithography, MEMS, and MOEMS, 2(9), p. 023004

DOI: 10.1117/1.3378152

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Micropore and nanopore fabrication in hollow antiresonant reflecting optical waveguides

Journal article published in 2010 by Tao Shang, Mikhail Rudenko, Philip Measor, Holger Schmidt, Aaron R. Hawkins ORCID, Matthew R. Holmes
This paper is available in a repository.
This paper is available in a repository.

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Abstract

We demonstrate the fabrication of micropore and nanopore features in hollow antiresonant reflecting optical waveguides to create an electrical and optical analysis platform that can size select and detect a single nanoparticle. Micropores (4 μm diameter) are reactive-ion etched through the top SiO(2) and SiN layers of the waveguides, leaving a thin SiN membrane above the hollow core. Nanopores are formed in the SiN membranes using a focused ion-beam etch process that provides control over the pore size. Openings as small as 20 nm in diameter are created. Optical loss measurements indicate that micropores did not significantly alter the loss along the waveguide.