Published in
IOP Publishing, Semiconductor Science and Technology, 3(35), p. 035006, 2020
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Plasma profiling time-of-flight mass spectrometry for fast elemental analysis of semiconductor structures with depth resolution in the nanometer range
Journal article published in 2020 by
Hendrik Spende 
,
Christoph Margenfeld,
Tobias Meyer ,
Irene Manglano Clavero,
Heiko Bremers,
Andreas Hangleiter,
Michael Seibt,
Andreas Waag,
Andrey Bakin
,
Christoph Margenfeld,
Tobias Meyer ,
Irene Manglano Clavero,
Heiko Bremers,
Andreas Hangleiter,
Michael Seibt,
Andreas Waag,
Andrey Bakin
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