Published in
Molecular Systems Design & Engineering, 1(4), p. 175-185, 2019
DOI: 10.1039/c8me00046h
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Self-assembly morphology of block copolymers in sub-10 nm topographical guiding patterns
Journal article published in 2019 by
S. Gottlieb 
,
B. Rösner,
L. Evangelio,
M. Fernández-Regúlez,
A. Nogales ,
M. C. García-Gutiérrez ,
T. F. Keller ,
J. Fraxedas ,
T. A. Ezquerra,
C. David,
F. Perez-Murano
,
B. Rösner,
L. Evangelio,
M. Fernández-Regúlez,
A. Nogales ,
M. C. García-Gutiérrez ,
T. F. Keller ,
J. Fraxedas ,
T. A. Ezquerra,
C. David,
F. Perez-Murano
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Abstract
Fabrication of sub-10 nm topographical guiding patterns, block copolymer directed self-assembly, thorough morphology analysis and free energy modelling.